Nanoscale Frictional Dissipation into Shear-Stressed Polymer Relaxations

Lars Jansen, André Schirmeisen, James L. Hedrick, Mark A. Lantz, Armin Knoll, Rachel Cannara, and Bernd Gotsmann
Phys. Rev. Lett. 102, 236101 – Published 9 June 2009

Abstract

Sliding friction between a silicon tip and a highly cross-linked polyaryletherketone film is studied using friction force microscopy. The friction force as a function of temperature between 150 and 500 K shows distinctive maxima corresponding to α and β polymer relaxations in dynamic mechanical analysis (DMA). In contrast to DMA, the nanoscale friction shows comparable coupling of mechanical energy to both relaxation modes. We report a strong shift in the peak temperatures with applied load. This effect is modeled with an Arrhenius activation by incorporating the applied shear stress in the effective activation energy of the two relaxations. The effect of the stress-shifted relaxation on friction-versus-load experiments is discussed.

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  • Received 19 December 2008

DOI:https://doi.org/10.1103/PhysRevLett.102.236101

©2009 American Physical Society

Authors & Affiliations

Lars Jansen and André Schirmeisen*

  • Physikalisches Institut, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany and Center for Nanotechnology (CeNTech), Heisenbergstrasse 11, 48149 Münster, Germany

James L. Hedrick

  • IBM Almaden Research, 650 Harry Road, San Jose, California 95120, USA

Mark A. Lantz, Armin Knoll, Rachel Cannara, and Bernd Gotsmann

  • IBM Zurich Research Laboratory, Säumerstrasse 4, CH-8803 Rüschlikon, Switzerland

  • *schirmeisen@uni-muenster.de

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Issue

Vol. 102, Iss. 23 — 12 June 2009

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