Band Offsets at the Si/SiO2 Interface from Many-Body Perturbation Theory

R. Shaltaf, G.-M. Rignanese, X. Gonze, Feliciano Giustino, and Alfredo Pasquarello
Phys. Rev. Lett. 100, 186401 – Published 5 May 2008

Abstract

We use many-body perturbation theory, the state-of-the-art method for band-gap calculations, to compute the band offsets at the Si/SiO2 interface. We examine the adequacy of the usual approximations in this context. We show that (i) the separate treatment of band structure and potential lineup contributions, the latter being evaluated within density-functional theory, is justified, (ii) most plasmon-pole models lead to inaccuracies in the absolute quasiparticle corrections, (iii) vertex corrections can be neglected, and (iv) eigenenergy self-consistency is adequate. Our theoretical offsets agree with the experimental ones within 0.3 eV.

  • Figure
  • Received 5 July 2007

DOI:https://doi.org/10.1103/PhysRevLett.100.186401

©2008 American Physical Society

Authors & Affiliations

R. Shaltaf1, G.-M. Rignanese1, X. Gonze1, Feliciano Giustino2,3,*, and Alfredo Pasquarello2,3

  • 1European Theoretical Spectroscopy Facility (ETSF) and Unité Physico-Chimie et de Physique des Matériaux (PCPM), Université Catholique de Louvain, 1 Place Croix du Sud, B-1348 Louvain-la-Neuve Belgique
  • 2Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Theoretical Physics, CH-1015 Lausanne, Switzerland
  • 3Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA), CH-1015 Lausanne, Switzerland

  • *Present address: Department of Physics, University of California at Berkeley, Berkeley, CA 94720, USA.

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Vol. 100, Iss. 18 — 9 May 2008

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