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Resonant Interferometric Lithography beyond the Diffraction Limit

M. Kiffner, J. Evers, and M. S. Zubairy
Phys. Rev. Lett. 100, 073602 – Published 19 February 2008
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Abstract

A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-field interactions, a multiphoton absorption medium is not required. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at very low laser intensities.

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  • Received 10 September 2007

DOI:https://doi.org/10.1103/PhysRevLett.100.073602

©2008 American Physical Society

Authors & Affiliations

M. Kiffner1, J. Evers1, and M. S. Zubairy1,2

  • 1Max-Planck-Institut für Kernphysik, Saupfercheckweg 1, 69117 Heidelberg, Germany
  • 2Institute for Quantum Studies and Department of Physics, Texas A&M University, College Station, Texas 77843, USA and Texas A&M University at Qatar, Education City, P. O. Box 23874, Doha, Qatar

See Also

Dark Physics Beats Light Limit

Michael Schirber
Phys. Rev. Focus 21, 6 (2008)

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Issue

Vol. 100, Iss. 7 — 22 February 2008

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