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High-pressure structural changes in liquid silica

A. Denoeud, S. Mazevet, F. Guyot, F. Dorchies, J. Gaudin, A. Ravasio, E. Brambrink, and A. Benuzzi-Mounaix
Phys. Rev. E 94, 031201(R) – Published 16 September 2016
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Abstract

The structural properties of liquid silica at high pressure and moderate temperature conditions, also referred to as the warm dense matter regime, were investigated using time-resolved K-edge x-ray absorption spectroscopy and ab initio calculations. We used a nanosecond laser beam to compress uniformly a solid SiO2 target and a picosecond laser beam to generate a broadband x-ray source. We obtained x-ray absorption spectra at the Si K edge over a large pressure-temperature domain to probe the liquid phase up to 3.6 times the normal solid density. Using ab initio simulations, we are able to interpret the changes in the x-ray absorption near-edge structure with increasing densities as an increase in the coordination number of silicon by oxygen atoms from 4 to 9. This indicates that, up to significant temperatures, the liquid structure becomes akin to what is found in the solid SiO2 phases.

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  • Received 27 January 2016

DOI:https://doi.org/10.1103/PhysRevE.94.031201

©2016 American Physical Society

Physics Subject Headings (PhySH)

Plasma Physics

Authors & Affiliations

A. Denoeud1,2,*, S. Mazevet3,4, F. Guyot5, F. Dorchies6, J. Gaudin6, A. Ravasio1,2, E. Brambrink1,2, and A. Benuzzi-Mounaix1,2

  • 1LULI-CNRS, Ecole Polytechnique, CEA, Université Paris-Saclay, F-91128 Palaiseau cedex, France
  • 2Sorbonne Universités, UPMC Univ. Paris 06, CNRS, Laboratoire d’Utilisation des Lasers Intenses (LULI), Place Jussieu, 75252 Paris cedex 05, France
  • 3LUTH, Observatoire de Paris, CNRS, Université Paris Diderot, 92195 Meudon, France
  • 4Département de Physique Théorique et Appliquée, CEA, 91680 Bruyère-le-Chatel, France
  • 5Institut de Minéralogie de Physique des Matériaux (IMPMC), Sorbonne Universités, MNHN, UPMC, IRD, Paris, France
  • 6Université Bordeaux, CNRS, CEA, CELIA (Centre Lasers Intenses et Applications), UMR 5107, Talence F-33405, France

  • *Corresponding author: adrien.denoeud@polytechnique.edu

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Issue

Vol. 94, Iss. 3 — September 2016

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