Abstract
In a previous paper [Phys. Rev. E 83, 021801 (2011)] we performed neutron reflectivity (NR) measurements on a five-layer polystyrene (PS) thin film consisting of alternatively stacked deuterated polystyrene (dPS) and hydrogenated polystyrene (hPS) layers (dPS/hPS/dPS/hPS/dPS, nm thick) on a Si substrate to reveal the distribution of along the depth direction. Information on the distribution is very useful to understand the interesting but unusual properties of polymer thin films. However, one problem that we have to clarify is if there are effects of deuterium labeling on or not. To tackle the problem we performed low-energy muon spin relaxation () measurements on the above-mentioned deuterium-labeled five-layer PS thin film as well as dPS and hPS single-layer thin films nm thick as a function of muon implantation energy. It was found that the deuterium labeling had no significant effects on the distribution, guaranteeing that we can safely discuss the unusual thin film properties based on the distribution revealed by NR on the deuterium-labeled thin films. In addition, the result suggested that the higher near the Si substrate is due to the strong orientation of phenyl rings.
- Received 11 April 2015
DOI:https://doi.org/10.1103/PhysRevE.92.022604
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