Ultrafast high-power microwave window breakdown: Nonlinear and postpulse effects

C. Chang, J. Verboncoeur, M. N. Guo, M. Zhu, W. Song, S. Li, C. H. Chen, X. C. Bai, and J. L. Xie
Phys. Rev. E 90, 063107 – Published 9 December 2014

Abstract

The time- and space-dependent optical emissions of nanosecond high-power microwave discharges near a dielectric-air interface have been observed by nanosecond-response four-framing intensified-charged-coupled device cameras. The experimental observations indicate that plasma developed more intensely at the dielectric-air interface than at the free-space region with a higher electric-field amplitude. A thin layer of intense light emission above the dielectric was observed after the microwave pulse. The mechanisms of the breakdown phenomena are analyzed by a three-dimensional electromagnetic-field modeling and a two-dimensional electromagnetic particle-in-cell simulation, revealing the formation of a space-charge microwave sheath near the dielectric surface, accelerated by the normal components of the microwave field, significantly enhancing the local-field amplitude and hence ionization near the dielectric surface. The nonlinear positive feedback of ionization, higher electron mobility, and ultraviolet-driven photoemission due to the elevated electron temperature are crucial for achieving the ultrafast discharge. Following the high-power microwave pulse, the sheath sustains a glow discharge until the sheath collapses.

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  • Received 10 April 2014
  • Revised 18 July 2014

DOI:https://doi.org/10.1103/PhysRevE.90.063107

©2014 American Physical Society

Authors & Affiliations

C. Chang1,2,3,*, J. Verboncoeur4,†, M. N. Guo1, M. Zhu1, W. Song1, S. Li1, C. H. Chen1, X. C. Bai1, and J. L. Xie1

  • 1Laboratory on Science and Technology of High Power Microwave, Northwest Institute of Nuclear Technology, Xi'an, Shaanxi 710024, China
  • 2Key Laboratory of Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an, Shaanxi 710049, China
  • 3Department of Engineering Physics, Tsinghua University, Beijing 100084, China
  • 4Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824, USA

  • *changc02@mails.tsinghua.edu.cn
  • johnv@msu.edu

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Vol. 90, Iss. 6 — December 2014

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