Morphologies from slippery ballistic deposition model: A bottom-up approach for nanofabrication

Anthony Robledo, Christopher N. Grabill, Stephen M. Kuebler, Aniruddha Dutta, Helge Heinrich, and Aniket Bhattacharya
Phys. Rev. E 83, 051604 – Published 13 May 2011

Abstract

We report pattern formation using a slippery ballistic deposition (SBD) model where growth germinates from a single site or from sites distributed periodically on a lattice. By changing the sticking probability ps and choosing systems with different lattice constants and symmetries, we demonstrate that a variety of patterns can be generated. These patterns can be further used as scaffolds for nanofabrication. We also demonstrate that by choosing a lateral sticking probability pl at the base that is different than ps, one can control both the early and late time morphologies originating from a seed. Furthermore, we indicate a possible generalization of preparing patterns to higher dimensions that in principle can have potential technological applications for preparing grooves and scaffolds of specific shapes and periodicities.

    • Received 1 October 2010

    DOI:https://doi.org/10.1103/PhysRevE.83.051604

    ©2011 American Physical Society

    Authors & Affiliations

    Anthony Robledo1, Christopher N. Grabill2, Stephen M. Kuebler1,2,3, Aniruddha Dutta1, Helge Heinrich1,4, and Aniket Bhattacharya1,*

    • 1Department of Physics, University of Central Florida, Orlando, Florida 32816-2385, USA
    • 2Department of Chemistry, University of Central Florida, Orlando, Florida 32816-2385, USA
    • 3CREOL, College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816-2385, USA
    • 4AMPAC, University of Central Florida, Orlando, Florida 32816-2385, USA

    • *aniket@physics.ucf.edu

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    Issue

    Vol. 83, Iss. 5 — May 2011

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