Morphology of fine-particle monolayers deposited on nanopatterned substrates

N. A. M. Araújo, A. Cadilhe, and Vladimir Privman
Phys. Rev. E 77, 031603 – Published 5 March 2008

Abstract

We study the effect of the presence of a regular substrate pattern on the irreversible adsorption of nanosized and colloid particles. Deposition of disks of radius r0 is considered, with the allowed regions for their center attachment at the planar surface consisting of square cells arranged in a square lattice pattern. We study the jammed state properties of a generalized version of the random sequential adsorption model for different values of the cell size, a, and cell-cell separation, b. The model shows a surprisingly rich behavior in the space of the two dimensionless parameters α=a2r0 and β=b2r0. Extensive Monte Carlo simulations for system sizes of 500×500 square lattice unit cells were performed by utilizing an efficient algorithm, to characterize the jammed state morphology.

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  • Received 19 September 2007

DOI:https://doi.org/10.1103/PhysRevE.77.031603

©2008 American Physical Society

Authors & Affiliations

N. A. M. Araújo

  • GCEP-Centro de Física da Universidade do Minho, 4710-057 Braga, Portugal

A. Cadilhe*

  • T-12 Group, MS 268, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA and GCEP-Centro de Física da Universidade do Minho, 4710-057 Braga, Portugal

Vladimir Privman

  • Department of Physics, and Center for Advanced Materials Processing, Clarkson University, Potsdam, New York 13699, USA

  • *cadilhe@lanl.gov

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Vol. 77, Iss. 3 — March 2008

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