Langevin equations for fluctuating surfaces

Alvin L.-S. Chua, Christoph A. Haselwandter, Chiara Baggio, and Dimitri D. Vvedensky
Phys. Rev. E 72, 051103 – Published 8 November 2005

Abstract

Exact Langevin equations are derived for the height fluctuations of surfaces driven by the deposition of material from a molecular beam. We consider two types of model: deposition models, where growth proceeds by the deposition and instantaneous local relaxation of particles, with no subsequent movement, and models with concurrent random deposition and surface diffusion. Starting from a Chapman-Kolmogorov equation the deposition, relaxation, and hopping rules of these models are first expressed as transition rates within a master equation for the joint height probability density function. The Kramers–Moyal–van Kampen expansion of the master equation in terms of an appropriate “largeness” parameter yields, according to a limit theorem due to Kurtz [Stoch. Proc. Appl. 6, 223 (1978)], a Fokker-Planck equation that embodies the statistical properties of the original lattice model. The statistical equivalence of this Fokker-Planck equation, solved in terms of the associated Langevin equation, and solutions of the Chapman-Kolmogorov equation, as determined by kinetic Monte Carlo (KMC) simulations of the lattice transition rules, is demonstrated by comparing the surface roughness and the lateral height correlations obtained from the two formulations for the Edwards-Wilkinson [Proc. R. Soc. London Ser. A 381, 17 (1982)] and Wolf-Villain [Europhys. Lett. 13, 389 (1990)] deposition models, and for a model with random deposition and surface diffusion. In each case, as the largeness parameter is increased, the Langevin equation converges to the surface roughness and lateral height correlations produced by KMC simulations for all times, including the crossover between different scaling regimes. We conclude by examining some of the wider implications of these results, including applications to heteroepitaxial systems and the passage to the continuum limit.

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  • Received 27 May 2005

DOI:https://doi.org/10.1103/PhysRevE.72.051103

©2005 American Physical Society

Authors & Affiliations

Alvin L.-S. Chua*, Christoph A. Haselwandter, Chiara Baggio, and Dimitri D. Vvedensky§

  • The Blackett Laboratory, Imperial College, London SW7 2BW, United Kingdom

  • *Present address: Institute of High Performance Computing, Singapore Science Park II, Singapore 117528.
  • christoph.haselwandter@imperial.ac.uk
  • Present address: Instituut-Lorentz, Universiteit Leiden, P.O. Box 9506, 2300 RA Leiden, The Netherlands.
  • §d.vvedensky@imperial.ac.uk

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Vol. 72, Iss. 5 — November 2005

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