Electrical conductivity of dense copper and aluminum plasmas

A. W. DeSilva and J. D. Katsouros
Phys. Rev. E 57, 5945 – Published 1 May 1998; Erratum Phys. Rev. E 59, 3774 (1999)
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Abstract

Measurements are reported of the electrical conductivity of dense copper and aluminum plasmas in the temperature range 10–30 kK, in a density range from about one-fifth solid density down to 0.02g/cm3. Plasmas were created by rapid vaporization of metal wires in a water bath. At temperatures below about 15 kK, as density decreases from the highest values measured, the conductivity falls roughly as the cube of density, reaches a minimum, and subsequently rises to approach the Spitzer prediction at low density. This minimum is not seen for temperatures above about 20 kK. These results are compared with several theoretical predictions.

  • Received 10 November 1997

DOI:https://doi.org/10.1103/PhysRevE.57.5945

©1998 American Physical Society

Erratum

Authors & Affiliations

A. W. DeSilva and J. D. Katsouros

  • Laboratory for Plasma Research and Department of Physics, University of Maryland at College Park, College Park, Maryland 20742

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Vol. 57, Iss. 5 — May 1998

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