Radial spatiotemporal evolution of rf magnetic field and plasma current in a very-high-frequency plasma source over a wide range of plasma density and pressure

Jianping Zhao, Peter L. G. Ventzek, Barton Lane, Toshihiko Iwao, and Kiyotaka Ishibashi
Phys. Rev. E 104, 025207 – Published 24 August 2021
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Abstract

We present detailed spatiotemporal measurements of rf magnetic fields and plasma conduction current as well as the corresponding plasma density profiles when very-high-frequency 100-MHz waves are introduced to a parallel plate plasma. The magnetic probe, optical emission, and plasma absorption probe measurements support a model in which the interaction of high-frequency waves with the moving plasma sheath at specific phases of the very high frequencies (VHF) period leads to local reversals in the vertical rf electric field which can lead to conduction current reversals and circulations. The presence of current reversals and circulation correlate with measured plasma uniformity. In particular, measured electric field and current reversals coincide with the strongly center-peaked plasma density profiles frequently observed in VHF plasma. The magnitude of the center peak increases with the number and magnitude of the current reversal cells. The scale length of the current reversal cells is on the order of what is expected for plasma surface waves. Measurements indicate that plasma conductivity is the common scaling factor for both plasma uniformity and the circulation. The propagation of high-frequency waves and the generation of rf current reversal in one phase of the rf cycle rather than another results in the appearance of harmonics in Fourier decomposed magnetic probe wave forms. These harmonics turn out not to be actual waves or evidence of standing waves at these frequencies but rather consequences of packets of wave propagation that occur periodically.

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  • Received 14 January 2020
  • Revised 4 May 2021
  • Accepted 22 July 2021

DOI:https://doi.org/10.1103/PhysRevE.104.025207

©2021 American Physical Society

Physics Subject Headings (PhySH)

Plasma Physics

Authors & Affiliations

Jianping Zhao*, Peter L. G. Ventzek, and Barton Lane

  • Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741, USA

Toshihiko Iwao and Kiyotaka Ishibashi

  • Tokyo Electron Technology Solutions Limited, 2381-1 Kitagejo, Fujii-cho, Nirasaki City, Yamanashi 407-8511, Japan

  • *jianping.zhao@us.tel.com
  • Present address: Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741, USA.
  • Present address: Tokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo 107-6325, Japan.

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Issue

Vol. 104, Iss. 2 — August 2021

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