Polarized electron acceleration in beam-driven plasma wakefield based on density down-ramp injection

Yitong Wu, Liangliang Ji, Xuesong Geng, Qin Yu, Nengwen Wang, Bo Feng, Zhao Guo, Weiqing Wang, Chengyu Qin, Xue Yan, Lingang Zhang, Johannes Thomas, Anna Hützen, Alexander Pukhov, Markus Büscher, Baifei Shen, and Ruxin Li
Phys. Rev. E 100, 043202 – Published 11 October 2019

Abstract

We investigate the precession of electron spins during beam-driven plasma-wakefield acceleration based on density down-ramp injection by means of full three-dimensional (3D) particle-in-cell (PIC) simulations. A relativistic electron beam generated via, e.g., laser wakefield acceleration, serves as the driving source. It traverses the prepolarized gas target and accelerates polarized electrons via the excited wakefield. We derive the criteria for the driving beam parameters and the limitation on the injected beam flux to preserve a high degree of polarization for the accelerated electrons, which are confirmed by our 3D PIC simulations and single-particle modeling. The electron-beam driver is free of the prepulse issue associated with a laser driver, thus eliminating possible depolarization of the prepolarized gas due to ionization by the prepulse. These results provide guidance for future experiments towards generating a source of polarized electrons based on wakefield acceleration.

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  • Received 27 June 2019
  • Revised 13 September 2019

DOI:https://doi.org/10.1103/PhysRevE.100.043202

©2019 American Physical Society

Physics Subject Headings (PhySH)

Plasma Physics

Authors & Affiliations

Yitong Wu1,2, Liangliang Ji1,3,*, Xuesong Geng1, Qin Yu1, Nengwen Wang1, Bo Feng1, Zhao Guo1, Weiqing Wang1, Chengyu Qin1, Xue Yan1, Lingang Zhang1, Johannes Thomas5, Anna Hützen6,7, Alexander Pukhov5, Markus Büscher6,7, Baifei Shen1,3,4,†, and Ruxin Li1,3,8,‡

  • 1State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3CAS Center for Excellence in Ultra-intense Laser Science, Shanghai 201800, China
  • 4Shanghai Normal University, Shanghai 200234, China
  • 5Institut für Theoretische Physik I, Heinrich-Heine-Universität Düsseldorf, 40225 Düsseldorf, Germany
  • 6Peter Grünberg Institut (PGI-6), Forschungszentrum Jülich, Wilhelm-Johnen-Str. 1, 52425 Jülich, Germany
  • 7Institut für Laser- und Plasmaphysik, Heinrich-Heine-Universität Düsseldorf, 40225 Düsseldorf, Germany
  • 8Shanghai Tech University, Shanghai 201210, China

  • *jill@siom.ac.cn
  • bfshen@mail.shcnc.ac.cn
  • ruxinli@mail.siom.ac.cn

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Issue

Vol. 100, Iss. 4 — October 2019

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