Abstract
Electron-electron interactions in topological junctions consisting of vertically stacked topological insulators are investigated. -type and -type of varying relative thicknesses are deposited using molecular beam epitaxy and their electronic properties measured using low-temperature transport. The screening factor is observed to decrease with increasing sample thickness, a finding which is corroborated by semiclassical Boltzmann theory. The number of two-dimensional states determined from electron-electron interactions is larger compared to the number obtained from weak antilocalization, in line with earlier experiments using single layers.
- Received 1 December 2018
DOI:https://doi.org/10.1103/PhysRevB.99.125139
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