Thickness dependence of electron-electron interactions in topological pn junctions

Dirk Backes, Danhong Huang, Rhodri Mansell, Martin Lanius, Jörn Kampmeier, David Ritchie, Gregor Mussler, Godfrey Gumbs, Detlev Grützmacher, and Vijay Narayan
Phys. Rev. B 99, 125139 – Published 25 March 2019
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Abstract

Electron-electron interactions in topological pn junctions consisting of vertically stacked topological insulators are investigated. n-type Bi2Te3 and p-type Sb2Te3 of varying relative thicknesses are deposited using molecular beam epitaxy and their electronic properties measured using low-temperature transport. The screening factor is observed to decrease with increasing sample thickness, a finding which is corroborated by semiclassical Boltzmann theory. The number of two-dimensional states determined from electron-electron interactions is larger compared to the number obtained from weak antilocalization, in line with earlier experiments using single layers.

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  • Received 1 December 2018

DOI:https://doi.org/10.1103/PhysRevB.99.125139

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Dirk Backes1,2,*, Danhong Huang3, Rhodri Mansell1, Martin Lanius4, Jörn Kampmeier4, David Ritchie1, Gregor Mussler4, Godfrey Gumbs5, Detlev Grützmacher4, and Vijay Narayan1,†

  • 1Cavendish Laboratory, University of Cambridge, J. J. Thomson Avenue, Cambridge CB3 0HE, United Kingdom
  • 2Department of Physics, Loughborough University, Epinal Way, Loughborough LE11 3TU, United Kingdom
  • 3Air Force Research Laboratory, Space Vehicles Directorate, Kirtland Air Force Base, New Mexico 87117, USA
  • 4Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany
  • 5Department of Physics and Astronomy, Hunter College of the City University of New York, 695 Park Avenue, New York, New York 10065, USA

  • *db639@cam.ac.uk
  • vn237@cam.ac.uk

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Issue

Vol. 99, Iss. 12 — 15 March 2019

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