Gate-tunable weak antilocalization in a few-layer InSe

Junwen Zeng, Shi-Jun Liang, Anyuan Gao, Yu Wang, Chen Pan, Chenchen Wu, Erfu Liu, Lili Zhang, Tianjun Cao, Xiaowei Liu, Yajun Fu, Yiping Wang, Kenji Watanabe, Takashi Taniguchi, Haizhou Lu, and Feng Miao
Phys. Rev. B 98, 125414 – Published 18 September 2018
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Abstract

Indium selenide (InSe) has attracted tremendous research interest due to its high mobility and potential applications in next-generation electronics. However, the underlying transport mechanism of carriers in thin InSe at low temperatures remains unknown. Here we report the gate voltage and temperature-dependent magnetotransport properties of γ-InSe transistor devices with Hall mobility up to 2455cm2V1s1 at the temperature of 1.7 K. We observe a gate-tunable weak antilocalization behavior at lower magnetic field B, which shows a transition to weak localization at higher B region. We find that the magnetotransport data agree well with the Hikami-Larkin-Nagaoka theory. The conductivity and temperature dependence of phase-coherence length reveal that the electron-electron (ee) interactions are dominated dephasing mechanism for electronic transport in γ-InSe at low temperatures. The maximum phase-coherence length is found to be 320 nm at 1.7 K, larger than that of monolayer MoS2 and few-layer black phosphorus. These results enrich the fundamental understanding of electronic transport properties of InSe.

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  • Received 30 April 2018
  • Revised 27 August 2018
  • Corrected 2 October 2018

DOI:https://doi.org/10.1103/PhysRevB.98.125414

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Corrections

2 October 2018

Correction: References [15] and [28] contained errors and have been corrected.

Authors & Affiliations

Junwen Zeng1, Shi-Jun Liang1, Anyuan Gao1, Yu Wang1, Chen Pan1, Chenchen Wu1, Erfu Liu1, Lili Zhang1, Tianjun Cao1, Xiaowei Liu1, Yajun Fu1, Yiping Wang1, Kenji Watanabe2, Takashi Taniguchi2, Haizhou Lu3, and Feng Miao1,*

  • 1National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China
  • 2National Institute for Materials Science, 1-1 Namiki Tsukuba, Ibaraki 305-0044, Japan
  • 3Institute for Quantum Science and Engineering and Department of Physics, South University of Science and Technology of China, Shenzhen 518055, China

  • *miao@nju.edu.cn

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Issue

Vol. 98, Iss. 12 — 15 September 2018

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