Atomically dispersed tungsten on metal halide monolayer as a ferromagnetic Chern insulator

Chengxi Huang, Kaiming Deng, Jian Zhou, and Erjun Kan
Phys. Rev. B 98, 115424 – Published 14 September 2018
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Abstract

Although the quantum anomalous Hall (QAH) effect has been experimentally observed in several magnetically doped topological insulators, up to now, it only survives at a very low temperature. More suitable candidate QAH insulators that can work at high temperature are much desired. Here, we propose an experimentally feasible way to realize a robust QAH insulator: atomically dispersed transition metals (e.g., W) on a two-dimensional porous metal halide normal insulator (e.g., InI3), which has been developed as a state-of-the-art chemical technology broadly adopted for homogeneous catalysis. Based on the first-principles calculations, we predict that the atomic W embedded in an InI3 monolayer forms an intrinsic ferromagnetic QAH insulator, which exhibits robust uniform out-of-plane ferromagnetic order up to 160K and a topologically nontrivial band gap of 56 meV with a nonzero Chern number (|C|=2). We also study its magneto-optical Kerr effect and collective plasma excitation modes, which may help for further experimental verifications and measurement of interesting physical features of Dirac-like electronic dispersion. Our results introduce a feasible method to obtain the QAH effect, which may motivate intensive experimental interest in this field.

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  • Received 14 June 2018
  • Revised 22 August 2018

DOI:https://doi.org/10.1103/PhysRevB.98.115424

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Chengxi Huang1, Kaiming Deng1, Jian Zhou2,*, and Erjun Kan1,†

  • 1Department of Applied Physics and Institution of Energy and Microstructure, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, People's Republic of China
  • 2Center for Advancing Materials Performance from the Nanoscale, State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, Chinaand Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA

  • *Author to whom correspondence should be addressed: jianzhou@mail.xjtu.edu.cn
  • ekan@njust.edu.cn

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Issue

Vol. 98, Iss. 11 — 15 September 2018

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