Excitation and decay of aluminum bulk plasmons at the aluminum/copper phthalocyanine interface

Gianluca Di Filippo, Marco Sbroscia, Giovanni Stefani, Robert A. Bartynski, and Alessandro Ruocco
Phys. Rev. B 97, 235420 – Published 12 June 2018

Abstract

We present the results of an experiment aimed at studying the archetypal properties of the aluminum bulk plasmon at an organic/metal interface. Electron-electron coincidence spectroscopy is used to determine the contribution of aluminum bulk plasmon decay to the ionization of a thin copper phthalocyanine film. The latter directly depends on the amplitude of the bulk plasmon electric field (generated in the metal substrate) protruding inside the molecular overlayer. The emission of low-energy electrons from the clean substrate is dominated by plasmon-assisted ionization events. These events are not observed when the molecules are adsorbed onto the surface. Our findings suggest that, for the considered system, the bulk plasmon wave is confined within the medium in which it is generated and the interaction of the plasmon field with electrons located in the molecular overlayer does not lead to the emission of low-energy electrons.

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  • Received 7 May 2018

DOI:https://doi.org/10.1103/PhysRevB.97.235420

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Gianluca Di Filippo1,*, Marco Sbroscia1, Giovanni Stefani1, Robert A. Bartynski2, and Alessandro Ruocco1

  • 1Dipartimento di Scienze, Università degli Studi Roma Tre, via della Vasca Navale 84, I-00146 Rome, Italy
  • 2Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers University, Frelinghuysen Road 136, Piscataway, New Jersey 08854, USA

  • *gianluca.difilippo@uniroma3.it

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Vol. 97, Iss. 23 — 15 June 2018

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