Abstract
Heteroepitaxial growth of transition-metal oxide films on the open (111) surface of results in significant restructuring due to the polar mismatch. Monitoring the structure and composition on an atomic scale of (111) interface as a function of processing conditions has enabled the avoidance of the expected polar catastrophe. Using atomically resolved transmission electron microscopy and spectroscopy as well as low-energy electron diffraction, the structure of the thin film, from interface to the surface, has been studied. In this paper, we show that the proper processing can lead to a structure that is ordered, coherent with the substrate without intermediate structural phase. Angle-resolved x-ray photoemission spectroscopy shows that the oxygen content of thin films increases with the film thickness, indicating that the polar mismatch is avoided by the presence of oxygen vacancies.
- Received 25 October 2016
- Revised 4 January 2017
DOI:https://doi.org/10.1103/PhysRevB.95.165434
©2017 American Physical Society