Enhancement of Auger recombination induced by carrier localization in InGaN/GaN quantum wells

M. Shahmohammadi, W. Liu, G. Rossbach, L. Lahourcade, A. Dussaigne, C. Bougerol, R. Butté, N. Grandjean, B. Deveaud, and G. Jacopin
Phys. Rev. B 95, 125314 – Published 20 March 2017
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Abstract

The origin of efficiency droop in state-of-the-art quality InGaN/GaN and GaN/AlGaN quantum wells (QWs) grown on various crystal planes is studied by means of time-resolved photoluminescence spectroscopy associated with a precise determination of the QW carrier density. In a first set of experiments, it is shown that a polar InGaN/GaN QW under nonresonant high optical excitation shows clear signatures of Auger loss mechanism and thus behaves quite differently compared to its binary based GaN/AlGaN QW counterpart, where no Auger signature is observed. In order to get rid of the impact of the built-in polarization field and illustrate the dominant role of carrier localization, similar experiments have been conducted on two m-plane InGaN/GaN QWs with similar In composition but a different degree of disorder. We demonstrate that carrier localization strongly enhances the Auger recombination process in nonpolar InGaN/GaN QWs. We also show that this effect may be further amplified by the presence of polarization fields on polar QWs. The relaxation of the k-selection rule during the Auger recombination process, resulting from QW potential disorder, can account for the enhancement of the efficiency droop in InGaN/GaN QWs.

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  • Received 18 March 2016
  • Revised 10 February 2017

DOI:https://doi.org/10.1103/PhysRevB.95.125314

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

M. Shahmohammadi1, W. Liu1, G. Rossbach1,*, L. Lahourcade1,*, A. Dussaigne2, C. Bougerol3, R. Butté1, N. Grandjean1, B. Deveaud1, and G. Jacopin1,†

  • 1Institute of Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 2University of Grenoble Alpes, CEA, LETI, MINATEC campus, F-38054 Grenoble, France
  • 3University of Grenoble Alpes, Institut Néel, F-38054 Grenoble, France

  • *Present address: OSRAM Opto Semiconductors GmbH, Leibnizstr. 4, 93055 Regensburg, Germany.
  • gwenole.jacopin@epfl.ch

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Issue

Vol. 95, Iss. 12 — 15 March 2017

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