Phase coexistence near the metal-insulator transition in a compressively strained NdNiO3 film grown on LaAlO3: Scanning tunneling, noise, and impedance spectroscopy studies

Ravindra Singh Bisht, Sudeshna Samanta, and A. K. Raychaudhuri
Phys. Rev. B 95, 115147 – Published 27 March 2017
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Abstract

We report an observation of phase coexistence near the metal-insulator transition (MIT) in a film of NdNiO3 grown on crystalline substrate LaAlO3. This was established through a combination of three techniques, namely, scanning tunneling spectroscopy, 1/f noise spectroscopy, and impedance spectroscopy experiments. The spatially resolved scanning tunneling spectroscopy showed that the two coexisting phases have different types of density of states (DOS) at the Fermi level. One phase showed a depleted DOS close to EF with a small yet finite correlation gap, while the other coexisting phase showed a metal-like DOS that had no depletion. The existence of the phase separation leads to a jump in the resistance fluctuation (as seen through 1/f noise spectroscopy) at the transition, and, notably, the fluctuation becomes non-Gaussian when there is a phase separation even in the metallic phase. This was corroborated by the impedance spectroscopy, which showed a broad hump in capacitance at the transition region as a signature of the existence of two phases that have widely different electrical conductivities. The phase separation starts well within the metallic phase much above the transition temperature and makes the sample electronically “inhomogeneous” in nanoscopic scale close to the transition. We discuss certain scenarios that lead to such a phase separation in the general context of strongly correlated oxides.

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  • Received 17 November 2016
  • Revised 19 February 2017

DOI:https://doi.org/10.1103/PhysRevB.95.115147

©2017 American Physical Society

Physics Subject Headings (PhySH)

  1. Research Areas
Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Ravindra Singh Bisht*, Sudeshna Samanta, and A. K. Raychaudhuri

  • Unit for Nanoscience, Department of Condensed Matter Physics and Material Sciences, S.N. Bose National Centre for Basic Sciences, Block JD, Sector 3, Salt Lake, Kolkata 700098, India

  • *Corresponding author: ravindra.bisht@bose.res.in
  • Present address: Centre for High Pressure Science & Technology Advanced Research, Shanghai 201203, P.R. China.
  • arup@bose.res.in

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Issue

Vol. 95, Iss. 11 — 15 March 2017

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