Effects of biaxial strain on the improper multiferroicity in hLuFeO3 films studied using the restrained thermal expansion method

Kishan Sinha, Yubo Zhang, Xuanyuan Jiang, Hongwei Wang, Xiao Wang, Xiaozhe Zhang, Philip J. Ryan, Jong-Woo Kim, John Bowlan, Dmitry A. Yarotski, Yuelin Li, Anthony D. DiChiara, Xuemei Cheng, Xifan Wu, and Xiaoshan Xu
Phys. Rev. B 95, 094110 – Published 14 March 2017
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Abstract

Elastic strain is potentially an important approach in tuning the properties of the improperly multiferroic hexagonal ferrites, the details of which, however, have been elusive due to experimental difficulties. Employing the method of restrained thermal expansion, we have studied the effect of isothermal biaxial strain in the basal plane of hLuFeO3 (001) films. The results indicate that a compressive biaxial strain significantly enhances the K3 structural distortion (the order parameter of the improper ferroelectricity), and the effect is larger at higher temperatures. The compressive biaxial strain and the enhanced K3 structural distortion together cause an increase in the electric polarization and a reduction in the canting of the weak ferromagnetic moments in hLuFeO3, according to our first principles calculations. These findings are important for understanding the strain effect as well as the coupling between the lattice and the improper multiferroicity in hLuFeO3. The experimental elucidation of the strain effect in hLuFeO3 films also suggests that the restrained thermal expansion can be a viable method to unravel the strain effect in many other thin film materials.

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  • Received 29 September 2016
  • Revised 6 February 2017

DOI:https://doi.org/10.1103/PhysRevB.95.094110

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Kishan Sinha1, Yubo Zhang2, Xuanyuan Jiang1, Hongwei Wang2, Xiao Wang3, Xiaozhe Zhang1,4, Philip J. Ryan5, Jong-Woo Kim5, John Bowlan6, Dmitry A. Yarotski6, Yuelin Li5, Anthony D. DiChiara5, Xuemei Cheng3, Xifan Wu2,*, and Xiaoshan Xu1,7,†

  • 1Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, USA
  • 2Department of Physics, Temple University, Philadelphia, Pennsylvania 19122, USA
  • 3Department of Physics, Bryn Mawr College, Bryn Mawr, Pennsylvania 19010, USA
  • 4Department of Physics, Xi'an Jiaotong University, Xi'an 710049, China
  • 5Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 6Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA
  • 7Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA

  • *xifanwu@temple.edu
  • xiaoshan.xu@unl.edu

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Issue

Vol. 95, Iss. 9 — 1 March 2017

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