Photoemission study of LaAlO3/SrTiO3 and LaAlO3/Nb:SrTiO3: Insulator-insulator versus insulator-semiconductor interfaces

Tomofumi Susaki, Shigenori Ueda, Kosuke Matsuzaki, Toshihiro Kobayashi, Yoshitake Toda, and Hideo Hosono
Phys. Rev. B 94, 075311 – Published 25 August 2016
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Abstract

By hard x-ray photoemission spectroscopy we have studied the electronic states of LaAlO3/SrTiO3(100) and LaAlO3/Nb : SrTiO3(100) heterostructures, where the polar LaAlO3 layer is grown on the insulating and conducting substrates, respectively. The analysis of the valence band has shown that the electron affinity is as small as +0.4eV in both the LaAlO3/SrTiO3 and LaAlO3/Nb:SrTiO3 heterostructures. The interface is “staggered type” (type II) in both of the heterostructures with the valence band maximum of LaAlO3 above the valence band maximum of SrTiO3. The valence band offset of 0.42 eV in the LaAlO3/SrTiO3 heterostructure has increased to 0.61 eV in the LaAlO3/Nb:SrTiO3 as the LaAlO3 component shifts towards the lower binding energy side. The electronic states of LaAlO3 and SrTiO3 have been merged with each other in the lower energy part of the valence band of the LaAlO3/Nb:SrTiO3 heterostructures.

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  • Received 11 March 2016
  • Revised 28 June 2016

DOI:https://doi.org/10.1103/PhysRevB.94.075311

©2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Tomofumi Susaki1,2,*, Shigenori Ueda3,4, Kosuke Matsuzaki1,2, Toshihiro Kobayashi1, Yoshitake Toda2, and Hideo Hosono1,2

  • 1Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503, Japan
  • 2Materials Research Center for Element Strategy, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503, Japan
  • 3Synchrotron X-ray Station at SPring-8, National Institute for Materials Science, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan
  • 4Quantum Beam Unit, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

  • *Present address: Mitsubishi Chemical Group Science and Technology Research Center, 1000 Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan; 0190251@cc.m-kagaku.co.jp.

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Issue

Vol. 94, Iss. 7 — 15 August 2016

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