Enhanced thermoelectric power in two-dimensional transition metal dichalcogenide monolayers

Jiang Pu, Kaito Kanahashi, Nguyen Thanh Cuong, Chang-Hsiao Chen, Lain-Jong Li, Susumu Okada, Hiromichi Ohta, and Taishi Takenobu
Phys. Rev. B 94, 014312 – Published 27 July 2016
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Abstract

The carrier-density-dependent conductance and thermoelectric properties of large-area MoS2 and WSe2 monolayers are simultaneously investigated using the electrolyte gating method. The sign of the thermoelectric power changes across the transistor off-state in the ambipolar WSe2 transistor as the majority carrier density switches from electron to hole. The thermopower and thermoelectric power factor of monolayer samples are one order of magnitude larger than that of bulk materials, and their carrier-density dependences exhibit a quantitative agreement with the semiclassical Mott relation based on the two-dimensional energy band structure, concluding the thermoelectric properties are enhanced by the low-dimensional effect.

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  • Received 9 March 2016
  • Revised 14 June 2016

DOI:https://doi.org/10.1103/PhysRevB.94.014312

©2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jiang Pu1,*, Kaito Kanahashi1, Nguyen Thanh Cuong2, Chang-Hsiao Chen3, Lain-Jong Li4, Susumu Okada5, Hiromichi Ohta6, and Taishi Takenobu1,7,†

  • 1Department of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan
  • 2International Center for Young Scientists (ICYS) and International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), Ibaraki 305-0044, Japan
  • 3Department of Automatic Control Engineering, Feng Chia University, Taichung 40724, Taiwan
  • 4Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Kingdom of Saudi Arabia
  • 5Graduate School of Pure and Applied Science, University of Tsukuba, Ibaraki 305-8571, Japan
  • 6Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0020, Japan
  • 7Kagami Memorial Laboratory for Material Science and Technology, Waseda University, Tokyo 169-0051, Japan

  • *hokoh.apple@fuji.waseda.jp
  • takenobu@waseda.jp

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Issue

Vol. 94, Iss. 1 — 1 July 2016

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