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Charge neutrality in epitaxial graphene on 6H-SiC(0001) via nitrogen intercalation

Nuala M. Caffrey, Rickard Armiento, Rositsa Yakimova, and Igor A. Abrikosov
Phys. Rev. B 92, 081409(R) – Published 21 August 2015

Abstract

The electronic properties of epitaxial graphene grown on SiC(0001) are known to be impaired relative to those of freestanding graphene. This is due to the formation of a carbon buffer layer between the graphene layers and the substrate, which causes the graphene layers to become strongly n-doped. Charge neutrality can be achieved by completely passivating the dangling bonds of the clean SiC surface using atomic intercalation. So far, only one element, hydrogen, has been identified as a promising candidate. We show, using first-principles density functional calculations, how it can also be accomplished via the growth of a thin layer of silicon nitride on the SiC surface. The subsequently grown graphene layers display the electronic properties associated with charge neutral graphene. We show that the surface energy of this structure is considerably lower than that of others with intercalated atomic nitrogen and determine how its stability depends on the N2 chemical potential.

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  • Received 20 May 2015

DOI:https://doi.org/10.1103/PhysRevB.92.081409

©2015 American Physical Society

Authors & Affiliations

Nuala M. Caffrey1,*, Rickard Armiento1, Rositsa Yakimova1, and Igor A. Abrikosov1,2,3

  • 1Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden
  • 2Materials Modeling and Development Laboratory, NUST “MISIS,” 119049 Moscow, Russia
  • 3LACOMAS Laboratory, Tomsk State University, 634050 Tomsk, Russia

  • *nuala.mai.caffrey@liu.se

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Vol. 92, Iss. 8 — 15 August 2015

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