LaAlO3/SrTiO3 interfaces doped with rare-earth ions

T. D. Sanders, M. T. Gray, F. J. Wong, and Y. Suzuki
Phys. Rev. B 91, 205112 – Published 14 May 2015

Abstract

Doping the LaAlO3 (LAO) side of the LaAlO3/SrTiO3 interface with 2% Tm or Lu does not significantly affect its electron transport. Also, at low temperatures, carrier mobility is steeply anticorrelated with carrier concentration for both doped and undoped interfaces. This relationship cannot be explained by ionized impurities alone but may be driven by positive charge in or on the LAO film.

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  • Received 6 December 2014
  • Revised 27 April 2015

DOI:https://doi.org/10.1103/PhysRevB.91.205112

©2015 American Physical Society

Authors & Affiliations

T. D. Sanders1,2,*, M. T. Gray3,2, F. J. Wong4, and Y. Suzuki1,2

  • 1Department of Applied Physics, Stanford University, Stanford, California 94305, USA
  • 2Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA
  • 3Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA
  • 4Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA

  • *tedsanders@stanford.edu

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Vol. 91, Iss. 20 — 15 May 2015

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