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Controlling the Schottky barrier at MoS2/metal contacts by inserting a BN monolayer

Mojtaba Farmanbar and Geert Brocks
Phys. Rev. B 91, 161304(R) – Published 17 April 2015

Abstract

Making a metal contact to the two-dimensional semiconductor MoS2 without creating a Schottky barrier is a challenge. Using density functional calculations we show that, although the Schottky barrier for electrons obeys the Schottky-Mott rule for high work function (4.7 eV) metals, the Fermi level is pinned at 0.1–0.3 eV below the conduction band edge of MoS2 for low work function metals, due to the metal-MoS2 interaction. Inserting a boron nitride (BN) monolayer between the metal and the MoS2 disrupts this interaction, and restores the MoS2 electronic structure. Moreover, a BN layer decreases the metal work function of Co and Ni by 2 eV, and enables a lineup of the Fermi level with the MoS2 conduction band. Surface modification by adsorbing a single BN layer is a practical method to attain vanishing Schottky barrier heights.

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  • Received 5 January 2015
  • Revised 10 February 2015

DOI:https://doi.org/10.1103/PhysRevB.91.161304

©2015 American Physical Society

Authors & Affiliations

Mojtaba Farmanbar and Geert Brocks*

  • Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

  • *g.h.l.a.brocks@utwente.nl

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Issue

Vol. 91, Iss. 16 — 15 April 2015

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