Abstract
Making a metal contact to the two-dimensional semiconductor without creating a Schottky barrier is a challenge. Using density functional calculations we show that, although the Schottky barrier for electrons obeys the Schottky-Mott rule for high work function eV) metals, the Fermi level is pinned at 0.1–0.3 eV below the conduction band edge of for low work function metals, due to the metal- interaction. Inserting a boron nitride (BN) monolayer between the metal and the disrupts this interaction, and restores the electronic structure. Moreover, a BN layer decreases the metal work function of Co and Ni by eV, and enables a lineup of the Fermi level with the conduction band. Surface modification by adsorbing a single BN layer is a practical method to attain vanishing Schottky barrier heights.
- Received 5 January 2015
- Revised 10 February 2015
DOI:https://doi.org/10.1103/PhysRevB.91.161304
©2015 American Physical Society