Atomically thin dilute magnetism in Co-doped phosphorene

L. Seixas, A. Carvalho, and A. H. Castro Neto
Phys. Rev. B 91, 155138 – Published 23 April 2015

Abstract

Two-dimensional dilute magnetic semiconductors can provide fundamental insights into the very nature of magnetic order and their manipulation through electron and hole doping. Besides the fundamental interest, due to the possibility of control of charge density, they can be extremely important in spintronics applications such as spin valve and spin-based transistors. In this paper, we studied a two-dimensional dilute magnetic semiconductor consisting of a phosphorene monolayer doped with cobalt atoms in substitutional and interstitial defects. We show that these defects can be stabilized and are electrically active. Furthermore, by including holes or electrons by a potential gate, the exchange interaction and magnetic order can be engineered, and may even induce a ferromagnetic-to-antiferromagnetic phase transition in p-doped phosphorene. At a Co concentration of 2.7%, we estimate a Curie temperature of TCMFA=466 K in the mean-field approximation.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 25 February 2015

DOI:https://doi.org/10.1103/PhysRevB.91.155138

©2015 American Physical Society

Authors & Affiliations

L. Seixas1,*, A. Carvalho1, and A. H. Castro Neto1,2

  • 1Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Singapore 117542, Singapore
  • 2Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215, USA

  • *seixasle@gmail.com

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 91, Iss. 15 — 15 April 2015

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×