Ultrathin Bi(110) films on Si(111)3×3B substrates

Ikuya Kokubo, Yusaku Yoshiike, Kan Nakatsuji, and Hiroyuki Hirayama
Phys. Rev. B 91, 075429 – Published 26 February 2015

Abstract

We studied the structure of ultrathin Bi(110) films on Si(111)3×3B substrates using scanning tunneling microscopy. Atomically flat Bi islands were nucleated on the substrates at room temperature. The edges of these islands were parallel to the short side of the Bi(110) rectangular unit cell. The islands extended along six specific orientations because the rectangular Bi(110) and rhombus 3×3 unit cells were commensurate at the interface. Bi(110) domains along different orientations coexisted and formed various domain boundary structures on the wide terraces of the islands. In particular, the domains along ±87 from the {11¯0} direction were connected perfectly on an atomic scale by changing the direction of the p-like bond of the in-plane zigzag chains locally at the straight domain boundary. No exclusive preference for the black phosphorus structure was observed for the Bi(110) ultrathin films, in contrast to the islands grown on the Si(111)7×7 substrate.

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  • Received 25 November 2014
  • Revised 3 February 2015

DOI:https://doi.org/10.1103/PhysRevB.91.075429

©2015 American Physical Society

Authors & Affiliations

Ikuya Kokubo, Yusaku Yoshiike, Kan Nakatsuji, and Hiroyuki Hirayama*

  • Department of Materials Science and Engineering, Tokyo Institute of Technology, J1-3, 4259 Nagatsuda, Midori-ku, Yokohama 226-8502, Japan

  • *hirayama.h.aa@m.titech.ac.jp

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Issue

Vol. 91, Iss. 7 — 15 February 2015

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