Imaging the buried MgO/Ag interface: Formation mechanism of the STM contrast

Andrei Malashevich, Eric I. Altman, and Sohrab Ismail-Beigi
Phys. Rev. B 90, 165426 – Published 20 October 2014

Abstract

Scanning tunneling microscopy (STM) provides real-space electronic state information at the atomic scale that is most commonly used to study materials surfaces. An intriguing extension of the method is to attempt to study the electronic structure at an insulator/conductor interface by performing low-bias imaging above the surface of an ultrathin insulating layer on the conducting substrate. We use first-principles theory to examine the physical mechanisms giving rise to the formation of low-bias STM images in the MgO/Ag system. We show that the main features of the low-bias STM contrast are completely determined by the atoms on the surface of MgO which overcomes prior ambiguities in assigning observed STM features to atomic positions of the substrate or thin film in such an epitaxial thin film system. Hence, the low-bias contrast is formed by states at the Fermi level in the Ag that propagate evanescently through the lattice and atomic orbitals of the MgO on their way to the surface. We develop a number of analysis techniques based on an ab initio tight-binding representation that allows identification of the origin of the STM contrast in cases where previous approaches have proven ambiguous.

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  • Received 21 July 2014
  • Revised 12 September 2014

DOI:https://doi.org/10.1103/PhysRevB.90.165426

©2014 American Physical Society

Authors & Affiliations

Andrei Malashevich1,2,*, Eric I. Altman1,3, and Sohrab Ismail-Beigi1,2,4,5

  • 1Center for Research on Interface Structures and Phenomena (CRISP), Yale University, New Haven, Connecticut 06520, USA
  • 2Department of Applied Physics, Yale University, New Haven, Connecticut 06520, USA
  • 3Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, USA
  • 4Department of Physics, Yale University, New Haven, Connecticut 06520, USA
  • 5Department of Mechanical Engineering and Materials Science, Yale University, New Haven, Connecticut 06520, USA

  • *andrei.malashevich@yale.edu

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Issue

Vol. 90, Iss. 16 — 15 October 2014

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