Abstract
The surface structure of epitaxial (100) thin film grown on Si(001) was analyzed using the quantitative low-energy electron diffraction intensity-voltage (LEED I-V) method, ab initio density functional theory (DFT) calculations, and scanning tunneling microscopy (STM). LEED patterns measured on the (100) surface reveal two domains of a reconstruction with diffraction symmetry. The iron-silicide film truncation and atomic surface structure were determined by LEED I-V method: The smallest Pendry's reliability factor was achieved for the bare film truncated by an Si layer, whereas Si and Fe ad-atom structures were excluded. Significant atomic relaxations within the topmost surface layers were revealed by the LEED I-V method and confirmed by DFT. The simulated STM patterns from the best-fit model agree well with the measured STM images on the surface: Four Si atoms on a surface form one bright protrusion on STM patterns. Electronic band structure analysis of the bulk and epitaxial (100) was carried out. A bare truncated epitaxial film was found to be metallic. Surface electronic states were identified by a partial -resolved atomic-orbital based local density-of-state analysis.
- Received 28 April 2014
- Revised 18 July 2014
DOI:https://doi.org/10.1103/PhysRevB.90.155305
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