Surface structure and electronic states of epitaxial βFeSi2(100)/Si(001) thin films: Combined quantitative LEED, ab initio DFT, and STM study

O. Romanyuk, K. Hattori, M. Someta, and H. Daimon
Phys. Rev. B 90, 155305 – Published 13 October 2014

Abstract

The surface structure of epitaxial βFeSi2(100) thin film grown on Si(001) was analyzed using the quantitative low-energy electron diffraction intensity-voltage (LEED I-V) method, ab initio density functional theory (DFT) calculations, and scanning tunneling microscopy (STM). LEED patterns measured on the βFeSi2(100) surface reveal two domains of a p(2×2) reconstruction with p2gg diffraction symmetry. The iron-silicide film truncation and atomic surface structure were determined by LEED I-V method: The smallest Pendry's reliability factor RP=0.22±0.02 was achieved for the bare βFeSi2 film truncated by an Si layer, whereas Si and Fe ad-atom structures were excluded. Significant atomic relaxations within the topmost surface layers were revealed by the LEED I-V method and confirmed by DFT. The simulated STM patterns from the best-fit model agree well with the measured STM images on the βFeSi2(100)/Si(001)p(2×2) surface: Four Si atoms on a surface form one bright protrusion on STM patterns. Electronic band structure analysis of the bulk and epitaxial βFeSi2(100) was carried out. A bare truncated epitaxial film was found to be metallic. Surface electronic states were identified by a partial k-resolved atomic-orbital based local density-of-state analysis.

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  • Received 28 April 2014
  • Revised 18 July 2014

DOI:https://doi.org/10.1103/PhysRevB.90.155305

©2014 American Physical Society

Authors & Affiliations

O. Romanyuk*

  • Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnická 10, 16200 Prague, Czech Republic

K. Hattori, M. Someta, and H. Daimon

  • Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan

  • *romanyuk@fzu.cz

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Vol. 90, Iss. 15 — 15 October 2014

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