Initial stages of oxygen adsorption on In/Si(111)-4×1

Hyungjoon Shim, Heechul Lim, Younghoon Kim, Sanghan Kim, Geunseop Lee, Hye-Kyoung Kim, Chiho Kim, and Hanchul Kim
Phys. Rev. B 90, 035420 – Published 16 July 2014

Abstract

The In/Si(111)4×1 surface with In wires is a prototypical one-dimensional electron system showing a temperature-induced structural phase transition. While most impurities are known to decrease the transition temperature (Tc), oxygen was reported to increase the Tc. In order to understand the exceptional influence of oxygen, we have examined the initial stages of oxygen adsorption on the surface by scanning tunneling microscopy (STM) and density-functional theory (DFT) calculations. Oxygen molecules were found to dissociate and adsorb as atoms on the surface. STM revealed three distinct O adsorption features as well as occasional transformations from one to another. The high-resolution images showed that all three adsorbed O features were located at the center of the In trimer at both edges of the In wire. This registry is in contradiction with the previous theoretical predictions [S. Wippermann et al., Phys. Rev. Lett. 100, 106802 (2008)]. The present DFT calculations identified two of the features as O atoms incorporated in the interstitial region between the In wire and subsurface Si layer.

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  • Received 16 February 2014
  • Revised 19 June 2014

DOI:https://doi.org/10.1103/PhysRevB.90.035420

©2014 American Physical Society

Authors & Affiliations

Hyungjoon Shim, Heechul Lim, Younghoon Kim, Sanghan Kim, and Geunseop Lee*

  • Department of Physics, Inha University, Incheon 402-751, Korea

Hye-Kyoung Kim, Chiho Kim, and Hanchul Kim

  • Department of Physics, Sookmyung Women's University, Seoul 140-742, Korea

  • *glee@inha.ac.kr
  • hanchul@sookmyung.ac.kr

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Issue

Vol. 90, Iss. 3 — 15 July 2014

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