Epitaxial hexagonal boron nitride on Ir(111): A work function template

Fabian Schulz, Robert Drost, Sampsa K. Hämäläinen, Thomas Demonchaux, Ari P. Seitsonen, and Peter Liljeroth
Phys. Rev. B 89, 235429 – Published 23 June 2014

Abstract

Hexagonal boron nitride (h-BN) is a prominent member in the growing family of two-dimensional materials with potential applications ranging from being an atomically smooth support for other two-dimensional materials to templating growth of molecular layers. We have studied the structure of monolayer h-BN grown by chemical vapor deposition on Ir(111) by low-temperature scanning tunneling microscopy (STM) and spectroscopy (STS) experiments and state-of-the-art density functional theory (DFT) calculations. The lattice mismatch between the h-BN and Ir(111) surface results in the formation of a moiré superstructure with a periodicity of 29 Å and a corrugation of 0.4 Å. By measuring the field emission resonances above the h-BN layer, we find a modulation of the work function within the moiré unit cell of 0.5 eV. DFT simulations for a 13-on-12 h-BN/Ir(111) unit cell confirm our experimental findings and allow us to relate the change in the work function to the subtle changes in the interaction between boron and nitrogen atoms and the underlying substrate atoms within the moiré unit cell. Hexagonal boron nitride on Ir(111) combines weak topographic corrugation with a strong work function modulation over the moiré unit cell. This makes h-BN/Ir(111) a potential substrate for electronically modulated thin film and heterosandwich structures.

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  • Received 15 April 2014
  • Revised 14 May 2014

DOI:https://doi.org/10.1103/PhysRevB.89.235429

©2014 American Physical Society

Authors & Affiliations

Fabian Schulz1, Robert Drost1, Sampsa K. Hämäläinen1, Thomas Demonchaux1,2, Ari P. Seitsonen3, and Peter Liljeroth1,*

  • 1Department of Applied Physics, Aalto University School of Science, P.O.Box 15100, 00076 Aalto, Finland
  • 2Institut d'Electronique et de Microélectronique et de Nanotechnologies, IEMN, CNRS, UMR 8520, Département ISEN, 41 bd Vauban, 59046 Lille Cedex, France
  • 3Institut für Chemie, University of Zürich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland

  • *peter.liljeroth@aalto.fi

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Vol. 89, Iss. 23 — 15 June 2014

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