GW calculations on post-transition-metal oxides

Youngho Kang, Gijae Kang, Ho-Hyun Nahm, Seong-Ho Cho, Young Soo Park, and Seungwu Han
Phys. Rev. B 89, 165130 – Published 23 April 2014

Abstract

In order to establish the reliable GW scheme that can be consistently applied to post-transition-metal oxides (post-TMOs), we carry out comprehensive GW calculations on electronic structures of ZnO, Ga2O3, In2O3, and SnO2, the four representative post-TMOs. Various levels of self-consistency (G0W0, GW0, and QPGW0) and different starting functionals (GGA, GGA + U, and hybrid functional) are tested and their influence on the resulting electronic structure is closely analyzed. It is found that the GW0 scheme with GGA + U as the initial functional turns out to give the best agreement with experiment, implying that describing the position of metal-d level precisely in the ground state plays a critical role for the accurate dielectric property and quasiparticle band gap. Nevertheless, the computation on ZnO still suffers from the shallow Zn-d level and we propose a modified approach (GW0+Ud) that additionally considers an effective Hubbard U term during GW0 iterations and thereby significantly improves the band gap. It is also shown that a GGA + U-based GW0(+Ud) scheme produces an accurate energy gap of crystalline InGaZnO4, implying that this can serve as a standard scheme that can be applied to general structures of post-TMOs.

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  • Received 13 January 2014
  • Revised 19 March 2014

DOI:https://doi.org/10.1103/PhysRevB.89.165130

©2014 American Physical Society

Authors & Affiliations

Youngho Kang1, Gijae Kang1, Ho-Hyun Nahm2,3, Seong-Ho Cho4, Young Soo Park4, and Seungwu Han1,*

  • 1Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul 151-755, Korea
  • 2Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul 151-747, Korea
  • 3Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Korea
  • 4Compound Semiconductor Laboratory, Samsung Advanced Institute of Technology, Samsung Electronics Corporation, Yongin-Si, Gyeonggi-Do 446-712, Korea

  • *hansw@snu.ac.kr

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Vol. 89, Iss. 16 — 15 April 2014

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