Atomic structure and electronic properties of the In/Si(111)2×2 surface

J. P. Chou, C. M. Wei, Y. L. Wang, D. V. Gruznev, L. V. Bondarenko, A. V. Matetskiy, A. Y. Tupchaya, A. V. Zotov, and A. A. Saranin
Phys. Rev. B 89, 155310 – Published 14 April 2014
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Abstract

The Si(111)2×2-In reconstruction can be considered as a precursor phase for the formation of the metallic 7×3 phases of In overlayers on a Si(111) surface. Using the ab initio random structure searching method, comparison of simulated and experimental scanning tunneling microscopy images, and resemblance of the calculated band structure to the experimental angle-resolved photoelectron spectra, we examined various 2×2 structure models with 0.5, 0.75, 1.0, and 1.25 monolayer In coverage. The only model which fits well all the requirements is the one-monolayer model, where three In atoms in the T4 sites form a trimer centered in the H3 site and the fourth In atom occupies the on-top (T1) site.

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  • Received 3 December 2013

DOI:https://doi.org/10.1103/PhysRevB.89.155310

©2014 American Physical Society

Authors & Affiliations

J. P. Chou1, C. M. Wei1, Y. L. Wang1, D. V. Gruznev2,3, L. V. Bondarenko2,3, A. V. Matetskiy2,3, A. Y. Tupchaya2,3, A. V. Zotov2,3,4, and A. A. Saranin2,3

  • 1Institute of Atomic and Molecular Sciences, Academia Sinica, P.O. Box 23-166 Taipei, Taiwan
  • 2Institute of Automation and Control Processes FEB RAS, 690041 Vladivostok, Russia
  • 3School of Natural Sciences, Far Eastern Federal University, 690000 Vladivostok, Russia
  • 4Department of Electronics, Vladivostok State University of Economics and Service, 690600 Vladivostok, Russia

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Vol. 89, Iss. 15 — 15 April 2014

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