Combined LDA and LDA-1/2 method to obtain defect formation energies in large silicon supercells

Filipe Matusalem, Mauro Ribeiro, Jr., Marcelo Marques, Ronaldo R. Pelá, Luiz G. Ferreira, and Lara K. Teles
Phys. Rev. B 88, 224102 – Published 10 December 2013

Abstract

A source of uncertainty in the state of the art calculations of defect levels is the inaccurate prediction of band-gap energies. Several approaches were developed to surpass this problem. However, another source of uncertainty remains: the small number of clustered atoms imposed by the computational restrictions. In this work, the LDA-1/2 method is explored in an attempt to overcome both problems with a small computational cost. We considered the self-interstitial defects in silicon as a benchmark for calculating defect states and charge-transition levels of point defects in semiconductors. We found neutral formation energies, including reaction barriers, of 4.65, 4.49, and 4.87 eV, for hexagonal, split 110 and C3v configurations, respectively, in good agreement with most experimental results.

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  • Received 23 September 2013

DOI:https://doi.org/10.1103/PhysRevB.88.224102

©2013 American Physical Society

Authors & Affiliations

Filipe Matusalem1,*, Mauro Ribeiro, Jr.1, Marcelo Marques1, Ronaldo R. Pelá1, Luiz G. Ferreira2,1, and Lara K. Teles1

  • 1Grupo de Materiais Semicondutores e Nanotecnologia, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos/SP, Brazil
  • 2Departamento de Física dos Materiais e Mecânica, Instituto de Física, Universidade de São Paulo (USP), 05315-970 São Paulo/SP, Brazil

  • *filipematus@gmail.com, gmsn@ita.br

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Issue

Vol. 88, Iss. 22 — 1 December 2013

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