Thin-film barristor: A gate-tunable vertical graphene-pentacene device

C. Ojeda-Aristizabal, W. Bao, and M. S. Fuhrer
Phys. Rev. B 88, 035435 – Published 22 July 2013

Abstract

We fabricate a vertical thin-film barristor device consisting of highly doped silicon (gate), 300 nm SiO2 (gate dielectric), monolayer graphene, pentacene, and a gold top electrode. We show that the current across the device is modulated by the Fermi energy level of graphene, tuned with an external gate voltage. We interpret the device current within the thermionic emission theory, showing a modulation of the energy barrier between graphene and pentacene as large as 300 meV.

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  • Received 8 March 2013

DOI:https://doi.org/10.1103/PhysRevB.88.035435

©2013 American Physical Society

Authors & Affiliations

C. Ojeda-Aristizabal1,*, W. Bao1, and M. S. Fuhrer1,2

  • 1Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742-4111, USA
  • 2School of Physics, Monash University, Victoria 3800, Australia

  • *Current address: Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA.

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Vol. 88, Iss. 3 — 15 July 2013

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