Manganese 3×3 and 3×3-R30 structures and structural phase transition on w-GaN(0001¯) studied by scanning tunneling microscopy and first-principles theory

Abhijit V. Chinchore, Kangkang Wang, Meng Shi, Andrada Mandru, Yinghao Liu, Muhammad Haider, Arthur R. Smith, Valeria Ferrari, Maria Andrea Barral, and Pablo Ordejón
Phys. Rev. B 87, 165426 – Published 15 April 2013

Abstract

Manganese deposited on the N-polar face of wurtzite gallium nitride [GaN (0001¯)] results in two unique surface reconstructions, depending on the deposition temperature. At lower temperature (less than 105C), it is found that a metastable 3×3 structure forms. Mild annealing of this Mn 3×3 structure leads to an irreversible phase transition to a different, much more stable 3×3R30 structure which can withstand high-temperature annealing. Scanning tunneling microscopy (STM) and reflection high-energy electron diffraction data are compared with results from first-principles theoretical calculations. Theory finds a lowest-energy model for the 3×3 structure consisting of Mn trimers bonded to the Ga adlayer atoms but not with N atoms. The lowest-energy model for the more stable 3×3R30 structure involves Mn atoms substituting for Ga within the Ga adlayer and thus bonding with N atoms. Tersoff-Hamman simulations of the resulting lowest-energy structural models are found to be in very good agreement with the experimental STM images.

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  • Received 5 January 2013

DOI:https://doi.org/10.1103/PhysRevB.87.165426

©2013 American Physical Society

Authors & Affiliations

Abhijit V. Chinchore*, Kangkang Wang, Meng Shi, Andrada Mandru, Yinghao Liu, Muhammad Haider§, and Arthur R. Smith

  • Nanoscale and Quantum Phenomena Institute, Physics and Astronomy, Ohio University, Athens, Ohio 45701, USA

Valeria Ferrari and Maria Andrea Barral

  • Centro Atómico Constituyentes, GIyA, CNEA, San Martín, Buenos Aires, Argentina

Pablo Ordejón

  • Centre d'Investigació en Nanociència i Nanotecnologia - CIN2 (CSIC-ICN), Campus UAB, 08193 Bellaterra, Barcelona, Spain

  • *Current address: Intel Corporation, Hillsboro, OR 97123.
  • Current address: Seagate Technologies, 47010 Kato Rd., Fremont, CA 94538.
  • Current address: University of Oregon, 1254 Franklin Blvd., Eugene, OR 97403.
  • §Current address: King Fahd University, P. O. Box 1821, Dhahran, 31261, Saudi Arabia.
  • Corresponding author: smitha2@ohio.edu

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Issue

Vol. 87, Iss. 16 — 15 April 2013

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