Abstract
The formation of large-area homogeneous graphene on a C-terminated SiC (000) surface was achieved via decomposition of the SiC (000) surface covered with an ultrathin but much more stable TiC layer than the reactive SiC(000). By heating the SiC (000) surface with a mixed powder of TiO and carbon at 1500–1550 °C in vacuum, an extremely homogeneous, epitaxial 0.75-nm-thick TiC(111) layer was grown on the SiC(000) surface over a millimeter-scale area. Graphitization of the TiC-masked SiC surface led to the growth of high-quality graphene layers, which consist of TiC- and SiC-derived carbon. High-resolution transmission electron microscopy revealed the presence of disordered stacking of graphene layers on SiC through an amorphous layer at the interface. This unique method will promise further progress of relatively high carrier mobility of graphene formed on the SiC (000) surface.
- Received 3 July 2012
DOI:https://doi.org/10.1103/PhysRevB.87.075431
©2013 American Physical Society