Suppression of mixed-phase areas in highly elongated BiFeO3 thin films on NdAlO3 substrates

Chang-Su Woo, Jin Hong Lee, Kanghyun Chu, Byung-Kweon Jang, Yong-Bae Kim, Tae Yeong Koo, Ping Yang, Yajun Qi, Zuhuang Chen, Lang Chen, Hong Chul Choi, Ji Hoon Shim, and Chan-Ho Yang
Phys. Rev. B 86, 054417 – Published 13 August 2012

Abstract

Mixed-phase areas are produced in highly elongated BiFeO3 (BFO) thin films as a consequence of strain relaxation. A (001) neodymium aluminate (NdAlO3; NAO) substrate (a3.747 Å) prominently suppresses the strain relaxation effect and prevents the formation of mixed-phase regions. This creates a pathway to the thick, quasipure, highly elongated phases required for magnetoelectric applications. We characterize the crystal structure, the interface between film and substrate, the surface morphology, and the ferroelectric domain structure of BFO films on NAO substrates and compare them with those of films on typical lanthanum aluminate substrates. The underlying mechanisms are discussed based on the intriguing nature of phase competition in bismuth ferrite phases using first principles density functional calculations for the misfit strain-dependent total energy.

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  • Received 9 May 2012

DOI:https://doi.org/10.1103/PhysRevB.86.054417

©2012 American Physical Society

Authors & Affiliations

Chang-Su Woo1, Jin Hong Lee1, Kanghyun Chu1, Byung-Kweon Jang1, Yong-Bae Kim2, Tae Yeong Koo3, Ping Yang4, Yajun Qi5, Zuhuang Chen5, Lang Chen5, Hong Chul Choi6, Ji Hoon Shim6, and Chan-Ho Yang1,7,*

  • 1Department of Physics, KAIST, Daejeon 305-701, Korea
  • 2Gumi Electronics & Information Technology Research Institute, Gumi, Gyungbuk 730-853, Korea
  • 3Pohang Accelerator Laboratory, Pohang, Gyungbuk 705-784, Korea
  • 4Singapore Synchrotron Light Source, National University of Singapore, Singapore 117603, Singapore
  • 5School of Materials Science and Engineering, 50 Nanyang Avenue, Nanyang Technological University, Singapore 639798, Singapore
  • 6Department of Chemistry, POSTECH, Pohang, Gyungbuk 705-784, Korea
  • 7Institute for the NanoCentury, KAIST, Daejeon 305-701, Korea

  • *Author to whom correspondence should be addressed: chyang@kaist.ac.kr

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Issue

Vol. 86, Iss. 5 — 1 August 2012

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