Structure and dielectric properties of amorphous high-κ oxides: HfO2, ZrO2, and their alloys

Yin Wang, Ferdows Zahid, Jian Wang, and Hong Guo
Phys. Rev. B 85, 224110 – Published 20 June 2012

Abstract

High-κ metal oxides are a class of materials playing an increasingly important role in modern device physics and technology. Here we report theoretical investigations of the properties of structural and lattice dielectric constants of bulk amorphous metal oxides by a combined approach of classical molecular dynamics (MD), for structure evolution, and quantum mechanical first-principles density function theory (DFT), for electronic structure analysis. Using classical MD based on the Born-Mayer-Buckingham potential function within a melt and quench scheme, amorphous structures of high-κ metal oxides Hf1xZrxO2 with different values of the concentration x are generated. The coordination numbers and the radial distribution functions of the structures are in good agreement with the corresponding experimental data. We then calculate the lattice dielectric constants of the materials from quantum mechanical first principles, and the values averaged over an ensemble of samples agree well with the available experimental data and are very close to the dielectric constants of their cubic form.

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  • Received 13 May 2012

DOI:https://doi.org/10.1103/PhysRevB.85.224110

©2012 American Physical Society

Authors & Affiliations

Yin Wang1,*, Ferdows Zahid1, Jian Wang1, and Hong Guo1,2

  • 1Department of Physics and the Center of Theoretical and Computational Physics, The University of Hong Kong, Pokfulam Road, Hong Kong SAR, China
  • 2Center for the Physics of Materials and Department of Physics, McGill University, Montreal, Quebec, Canada H3A 2T8

  • *yinwang@hku.hk

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Vol. 85, Iss. 22 — 1 June 2012

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