Thermal quench effects on ferroelectric domain walls

P. Paruch, A. B. Kolton, X. Hong, C. H. Ahn, and T. Giamarchi
Phys. Rev. B 85, 214115 – Published 15 June 2012

Abstract

Using piezoresponse force microscopy on epitaxial ferroelectric thin films, we have measured the evolution of domain wall roughening as a result of heat-quench cycles up to 735 C, with the effective roughness exponent ζ changing from 0.25 to 0.5. We discuss two possible mechanisms for the observed ζ increase: a quench from a thermal one-dimensional configuration and from a locally equilibrated pinned configuration with a crossover from a two- to one-dimensional regime. We find that the postquench spatial structure of the metastable states, qualitatively consistent with the existence of a growing dynamical length scale whose ultraslow evolution is primarily controlled by the defect configuration and heating process parameters, makes the second scenario more plausible. This interpretation suggests that pinning is relevant in a wide range of temperatures and, in particular, that purely thermal domain wall configurations might not be observable in this glassy system. We also demonstrate the crucial effects of oxygen vacancies in stabilizing domain structures.

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  • Received 8 February 2012

DOI:https://doi.org/10.1103/PhysRevB.85.214115

©2012 American Physical Society

Authors & Affiliations

P. Paruch1,*, A. B. Kolton2, X. Hong3,†, C. H. Ahn3, and T. Giamarchi1

  • 1DPMC-MaNEP, Université de Genève, 24 Quai Ernest Ansermet, 1211 Geneva, Switzerland
  • 2CONICET, Centro Atómico Bariloche, 8400 San Carlos de Bariloche, Río Negro, Argentina
  • 3DAP, Yale University, P. O. Box 208284, New Haven, Connecticut 06520-0284, USA

  • *patrycja.paruch@unige.ch
  • Present address: DPA, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA.

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Issue

Vol. 85, Iss. 21 — 1 June 2012

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