Formation, migration, and clustering of delocalized vacancies and interstitials at a solid-state semicoherent interface

Kedarnath Kolluri and Michael J. Demkowicz
Phys. Rev. B 85, 205416 – Published 10 May 2012

Abstract

Atomistic simulations are used to study the formation, migration, and clustering of delocalized vacancies and interstitials at a model fcc-bcc semicoherent interface formed by adjacent layers of Cu and Nb. These defects migrate between interfacial trapping sites through a multistep mechanism that may be described using dislocation mechanics. Similar mechanisms operate in the formation, migration, and dissociation of interfacial point defect clusters. Effective migration rates may be computed using the harmonic approximation of transition state theory with a temperature-dependent prefactor. Our results demonstrate that delocalized vacancies and interstitials at some interfaces may be viewed as genuine defects, albeit governed by mechanisms of higher complexity than conventional point defects in crystalline solids.

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  • Received 21 December 2011

DOI:https://doi.org/10.1103/PhysRevB.85.205416

©2012 American Physical Society

Authors & Affiliations

Kedarnath Kolluri*

  • Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA and MST-8, Materials Science in Radiation and Dynamic Extremes, Los Alamos National Lab, Los Alamos, New Mexico 87545, USA

Michael J. Demkowicz

  • Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA

  • *kkolluri@lanl.gov

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Vol. 85, Iss. 20 — 15 May 2012

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