Magnetoresistance and negative differential resistance in Ni/graphene/Ni vertical heterostructures driven by finite bias voltage: A first-principles study

Kamal K. Saha, Anders Blom, Kristian S. Thygesen, and Branislav K. Nikolić
Phys. Rev. B 85, 184426 – Published 25 May 2012

Abstract

Using the nonequilibrium Green's function formalism combined with density functional theory, we study finite bias quantum transport in Ni/Grn/Ni vertical heterostructures where n graphene layers are sandwiched between two semi-infinite Ni(111) electrodes. We find that the recently predicted “pessimistic” magnetoresistance of 100% for n5 junctions at zero bias voltage Vb0 persists up to Vb0.4 V, which makes such devices promising for spin-torque-based device applications. In addition, for parallel orientations of the Ni magnetizations, the n=5 junction exhibits a pronounced negative differential resistance as the bias voltage is increased from Vb=0 V to Vb0.5 V. We confirm that both of these nonequilibrium transport effects hold for different types of bonding of Gr on the Ni(111) surface while maintaining Bernal stacking between individual Gr layers.

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  • Received 29 March 2012

DOI:https://doi.org/10.1103/PhysRevB.85.184426

©2012 American Physical Society

Authors & Affiliations

Kamal K. Saha1, Anders Blom2, Kristian S. Thygesen3, and Branislav K. Nikolić1,*

  • 1Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716-2570, USA
  • 2QuantumWise A/S, Lersø Parkallé 107, DK-2100 Copenhagen, Denmark
  • 3Center for Atomic-Scale Materials Design (CAMD) and Center for Nanostructured Graphene (CNG), Department of Physics, Technical University of Denmark, DK-2800 Kongens Lyngby, Denmark

  • *bnikolic@udel.edu

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Vol. 85, Iss. 18 — 1 May 2012

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