Role of nitrogen split interstitial defects in the magnetic properties of Cu-doped GaN

Y. Liu, Z. Gai, M. Weinert, and L. Li
Phys. Rev. B 85, 075207 – Published 13 February 2012

Abstract

Cu-doped GaN thin films are grown by plasma-assisted molecular beam epitaxy. With nitrogen plasma only, films phase segregate into GaN and Cu-rich alloys. In contrast, when nitrogen-hydrogen plasma is used, the films are single-phased Ga1xCuxN, with x as high as 0.04. Contrary to earlier studies, however, these films are not ferromagnetic, but rather paramagnetic in nature. First-principles calculations indicate that although each substitutional CuGa exhibits a moment of 1 μB/Cu, it can be suppressed by neighboring intrinsic defects such as N split interstitials.

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  • Received 10 October 2011

DOI:https://doi.org/10.1103/PhysRevB.85.075207

©2012 American Physical Society

Authors & Affiliations

Y. Liu1, Z. Gai2, M. Weinert1, and L. Li1,*

  • 1Department of Physics, University of Wisconsin, Milwaukee, Wisconsin 53211, USA
  • 2Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831 USA

  • *lianli@uwm.edu

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Issue

Vol. 85, Iss. 7 — 15 February 2012

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