Hydrogenated graphene on silicon dioxide surfaces

P. Havu, M. Ijäs, and A. Harju
Phys. Rev. B 84, 205423 – Published 14 November 2011

Abstract

Hydrogenation of graphene on the α-quartz (0001) SiO2 substrate is studied, considering different surface terminations in order to take into account the amorphic nature of the material. Our ab initio calculations show that the formation of graphane by hydrogen adsorption on graphene is energetically favored on hydroxyl- and oxygen-terminated surfaces, whereas silicon termination and reconstruction of the oxygen termination hinder adsorption. Our results indicate that in order to hydrogenate graphene on SiO2, it is beneficial to oxygenize the surface and saturate it with hydrogen. For the pristine graphene on the substrate, we find only marginal changes in the low-energy band structure for all surface terminations.

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  • Received 12 August 2011

DOI:https://doi.org/10.1103/PhysRevB.84.205423

©2011 American Physical Society

Authors & Affiliations

P. Havu*, M. Ijäs, and A. Harju

  • Department of Applied Physics and Helsinki Institute of Physics, Aalto University School of Science, Espoo, Finland

  • *Paula.Havu@aalto.fi

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Issue

Vol. 84, Iss. 20 — 15 November 2011

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