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Vertical field-effect transistor based on wave-function extension

A. Sciambi, M. Pelliccione, M. P. Lilly, S. R. Bank, A. C. Gossard, L. N. Pfeiffer, K. W. West, and D. Goldhaber-Gordon
Phys. Rev. B 84, 085301 – Published 18 August 2011
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Abstract

We demonstrate a mechanism for a dual layer, vertical field-effect transistor, in which nearly depleting one layer will extend its wave function to overlap the other layer and increase tunnel current. We characterize this effect in a specially designed GaAs/AlGaAs device, observing a tunnel current increase of two orders of magnitude at cryogenic temperatures, and we suggest extrapolations of the design to other material systems such as graphene.

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  • Received 19 January 2011

DOI:https://doi.org/10.1103/PhysRevB.84.085301

©2011 American Physical Society

Synopsis

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Better transistors through quantum mechanics

Published 18 August 2011

More compact transistors may be possible by harnessing the quantum properties of semiconductor heterostructures.

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Authors & Affiliations

A. Sciambi1,2, M. Pelliccione1,2, M. P. Lilly3, S. R. Bank4,5, A. C. Gossard4, L. N. Pfeiffer6, K. W. West6, and D. Goldhaber-Gordon2,7,*

  • 1Department of Applied Physics, Stanford University, Stanford, California 94305-4045, USA
  • 2SIMES, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, USA
  • 3Center for Integrated Nanotechnologies, Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
  • 4Materials Department, University of California Santa Barbara, Santa Barbara, California 93106, USA
  • 5Electrical and Computer Engineering Department, University of Texas at Austin, Austin, Texas 78758, USA
  • 6Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA
  • 7Department of Physics, Stanford University, Stanford, California 94305-4045, USA

  • *Corresponding author: goldhaber-gordon@stanford.edu

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Issue

Vol. 84, Iss. 8 — 15 August 2011

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