Controlling the self-doping of epitaxial graphene on SiC via Ar ion treatment

Hae-geun Jee, Kyung-Hwan Jin, Jin-Hee Han, Han-Na Hwang, Seung-Hoon Jhi, Young Dok Kim, and Chan-Cuk Hwang
Phys. Rev. B 84, 075457 – Published 11 August 2011

Abstract

We present a simple but efficient way to control substrate-induced doping of graphene via mechanical deformations induced by Ar ions. Graphene on SiC is n-doped because of the substrate-to-graphene charge transfer. Using angle-resolved photoemission spectroscopy (ARPES), core level shift, and scanning tunneling microscopy (STM), the treatment with 0.5-keV Ar ions was found to reduce the charge transfer. First-principles calculations suggest that Stone-Wales defects among various defect structures are likely responsible for the change in the substrate-graphene charge transfer.

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  • Received 2 April 2011

DOI:https://doi.org/10.1103/PhysRevB.84.075457

©2011 American Physical Society

Authors & Affiliations

Hae-geun Jee1, Kyung-Hwan Jin2, Jin-Hee Han2, Han-Na Hwang1, Seung-Hoon Jhi2,*, Young Dok Kim3,*, and Chan-Cuk Hwang1,*

  • 1Beamline Research Division, Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea
  • 2Department of Physics and Division of Advanced Materials Science, POSTECH, Pohang 790-784, Korea
  • 3Department of Chemistry, Sungkyunkwan University (SKKU), Suwon 440-746, Korea

  • *cchwang@postech.ac.kr, ydkim91@skku.edu, jhish@postech.ac.kr

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Vol. 84, Iss. 7 — 15 August 2011

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