Nature of the band gap of Tl2O3

Aoife B. Kehoe, David O. Scanlon, and Graeme W. Watson
Phys. Rev. B 83, 233202 – Published 9 June 2011

Abstract

The ground state electronic structure of thallic oxide has been a source of controversy in the literature, with Tl2O3 reported to be either a degenerate n-type semiconductor or an intrinsic semimetal with no band gap. Using a screened hybrid density functional theory (DFT) approach, we show that Tl2O3 is a semiconductor with a predicted band gap of 0.33 eV. We rationalize the large optical band gaps reported in experimental studies and demonstrate that previous “standard” DFT approaches wrongly predict Tl2O3 to be a semimetal. Doubly ionized oxygen vacancies are shown to be the origin of the high carrier concentrations seen experimentally.

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  • Received 11 February 2011

DOI:https://doi.org/10.1103/PhysRevB.83.233202

©2011 American Physical Society

Authors & Affiliations

Aoife B. Kehoe, David O. Scanlon*, and Graeme W. Watson

  • School of Chemistry and CRANN, Trinity College Dublin, Dublin 2, Ireland

  • *scanloda@tcd.ie
  • watsong@tcd.ie

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Issue

Vol. 83, Iss. 23 — 15 June 2011

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