Abstract
We report the application of resonant inelastic x-ray scattering to explore the nature of the single conducting interface in the oxide heterostructure . From the crystal-field excitations measured at the resonance we not only derive information on the local geometry at the interface but are also able to follow the evolution of the sheet carrier density with the thickness of the overlayer. These findings confirm after calibration to previous hard x-ray photoelectron spectroscopy measurements that the charge density from spectroscopy exceeds the one derived from Hall-effect measurements, indicating the coexistence of itinerant and localized electrons at the interface. On the other hand, we observe a saturation of the charge-carrier concentration above a thickness of 6 unit cells at , well below the canonical value for ideal electronic reconstruction.
- Received 8 November 2010
DOI:https://doi.org/10.1103/PhysRevB.82.241405
©2010 American Physical Society