Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction

Masaki Hada, Kunio Okimura, and Jiro Matsuo
Phys. Rev. B 82, 153401 – Published 5 October 2010

Abstract

The lattice motion and displacement of atoms in the unit cell in vanadium dioxide (VO2) grown on c-Al2O3 were characterized by static and time-resolved x-ray diffraction (XRD) measurements. The monoclinic-tetragonal phase transition of the VO2 unit cell and the twist motion of vanadium atoms in the unit cell were observed. The time-resolved XRD measurements were performed in air using a tabletop high-repetition femtosecond laser. The results obtained from the time-resolved XRD measurements suggested that the unit cell of the low-temperature monoclinic VO2 transformed into the high-temperature tetragonal phase extremely rapidly (within 25 ps); however, the atoms in the unit cell fluctuated or vibrated about the center of the tetragonal coordinates, which abated within 100ps. Thus, the time-resolved XRD measurements of the Bragg angle, intensity, and width of the diffraction lines simultaneously revealed the phase transition of VO2 and the atomic motion in the unit cell.

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  • Received 6 September 2010

DOI:https://doi.org/10.1103/PhysRevB.82.153401

©2010 American Physical Society

Authors & Affiliations

Masaki Hada*

  • Department of Nuclear Engineering, Kyoto University, Sakyo, Kyoto 606-8501, Japan

Kunio Okimura

  • Faculty of Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan

Jiro Matsuo

  • Quantum Science and Engineering Center, Kyoto University, Uji, Kyoto 611-0011, Japan

  • *hadamasaki@nucleng.kyoto-u.ac.jp
  • matsuo@nucleng.kyoto-u.ac.jp

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Issue

Vol. 82, Iss. 15 — 15 October 2010

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