Electron knock-on damage in hexagonal boron nitride monolayers

J. Kotakoski, C. H. Jin, O. Lehtinen, K. Suenaga, and A. V. Krasheninnikov
Phys. Rev. B 82, 113404 – Published 7 September 2010

Abstract

We combine first-principles molecular-dynamics simulations with high-resolution transmission electron microscopy experiments to draw a detailed microscopic picture of irradiation effects in hexagonal boron nitride (h-BN) monolayers. We determine the displacement threshold energies for boron and nitrogen atoms in h-BN, which differ significantly from the tight-binding estimates found in the literature and remove ambiguity from the interpretation of the experimental results. We further develop a kinetic Monte Carlo model which allows to extend the simulations to macroscopic time scales and make a direct comparison between theory and experiments. Our results provide a comprehensive picture of the response of h-BN nanostructures to electron irradiation.

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  • Received 23 July 2010

DOI:https://doi.org/10.1103/PhysRevB.82.113404

©2010 American Physical Society

Authors & Affiliations

J. Kotakoski1, C. H. Jin2,3, O. Lehtinen1, K. Suenaga2, and A. V. Krasheninnikov1,4

  • 1Materials Physics Division, University of Helsinki, P.O. Box 43, 00014 Helsinki, Finland
  • 2Nanotube Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
  • 3Department of Materials Science and Engineering, Meijo University, Tenpaku-ku, Nagoya 468-8502, Japan
  • 4Department of Applied Physics, Aalto University, P.O. Box 1100, 00076 Aalto, Finland

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Issue

Vol. 82, Iss. 11 — 15 September 2010

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